Tender For supply, delivery and erection of gravity feed chlorination plant 0 to 10kg/hr associated with required instrumentation at stp - tukivakam with required shelter for chlorinator and supply and delivery of vaporized liquidchlorinegascylinders to stp - tukivakam in tirupati municipal corporation, tirupati.
Tender For refilling of liquidchlorinegascylinders of 100 kg. each capacity from authorized filling station for different ohr sites at new town under ntk project.
Tender For suuply and delivery of vaporized liquidchlorinegascylinder (900kgs) ferrec alum & bleaching powder at ss tank ( for 4months may, june, july, august 2026) of nellore municipal corporation
Tender For corrigendum : supply and delivery of vaporised liquidchlorinegascylinders of 900 kgs at raw water & clear water pump house at ss tank for maintenance of water supply in chirala municipality
Tender For refilling of liquidchlorinegascylinder of 50 kg. each capacity from authorized filling station for different ohr sites under surface water supply scheme under panskura-ii block in the district of purba medinipur under mmd phe dte.
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For refilling of liquidchlorinegascylinder of 100 kg each capacity from any authorized filling station for ohr sites at bishnupur-i under smd, phe dte.
Tender For refilling of liquidchlorinegascylinder of 100 kg each capacity from any authorized filling station for ohr sites at joka-i and ii under smd, phe dte.
Tender For supply and delivery of vaporized liquidchlorinegascylinders, ferric alum blocks at 17 mld capacity new & 4.83 mld old filtration plants, head water works in the guntakal municipality under general funds 2026-2027
Tender For corrigendum : supply and refilling of dry nitrogen gas along with nitrogen gascylinder parts testing and painting for 8.5 e-9 abl make coal mills installed at unit no. 1 to 4 at sgtps, mppgcl, birsinghpur. - supply & refilling of “dry nitrogen gas along with nitrogen gascylinder parts” testing and painting for 8.5 e-9 abl make coal mills installed at unit no. 1 to 4 at sgtps, mppgcl, birsinghpur.